Formation and stability of Ni(Pt)Si/Poly-Si layered structure (2004)
Source: Microelectronics technology and devices SBMicro 2004. Proceedings, v. 2004-03. Conference titles: International Symposium on Microelectronics Technology and Devices SBMICRO. Unidade: EP
Subjects: MICROELETRÔNICA, FILMES FINOS, ELETROQUÍMICA
ABNT
SANTOS, Regis E. et al. Formation and stability of Ni(Pt)Si/Poly-Si layered structure. 2004, Anais.. Pennington: The Electrochemical Society, 2004. . Acesso em: 12 maio 2024.APA
Santos, R. E., Doi, I., Teixeira, R. C., Diniz, J. A., Swart, J. W., & Santos Filho, S. G. dos. (2004). Formation and stability of Ni(Pt)Si/Poly-Si layered structure. In Microelectronics technology and devices SBMicro 2004. Proceedings, v. 2004-03. Pennington: The Electrochemical Society.NLM
Santos RE, Doi I, Teixeira RC, Diniz JA, Swart JW, Santos Filho SG dos. Formation and stability of Ni(Pt)Si/Poly-Si layered structure. Microelectronics technology and devices SBMicro 2004. Proceedings, v. 2004-03. 2004 ;[citado 2024 maio 12 ]Vancouver
Santos RE, Doi I, Teixeira RC, Diniz JA, Swart JW, Santos Filho SG dos. Formation and stability of Ni(Pt)Si/Poly-Si layered structure. Microelectronics technology and devices SBMicro 2004. Proceedings, v. 2004-03. 2004 ;[citado 2024 maio 12 ]